Publications Archive

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Role of hydrogen in volatile behaviour of defects in SiO2-based electronic devices

Y. Wimmer, A.-M. El-Sayed, W. Gös, T. Grasser, A. L. Shluger, Proc. R. Soc. A, 472, 2190 (2016).

Electronic properties of epitaxial cerium oxide films during controlled reduction and oxidation studied by resonant inelastic x-ray scattering

G. Gasperi, L. Amidani, F. Benedetti, F. Boscherini, P. Glatzel, S. Valeri, P. Luches, Phys. Chem. Chem. Phys. 18, 20511 (2016).

Reduction of Pt2+ species in model Pt–CeO2 fuel cell catalysts upon reaction with methanol

A. Neitzel, V. Johánek, Y. Lykhach, T. Skála, N. Tsud, M. Vorokhta, V. Matolín, J. Libuda, Appl. Surf. Sci. 387, 674 (2016).

Ultrasmooth Ru(0001) Films as Templates for Ceria Nanoarchitectures

M. Sauerbrey, J. Höcker, M.Wellbrock, M. Schowalter, J.-O. Krisponeit, K. Müller-Caspary, A. Rosenauer, G. Weiss, L. Colombi Ciacchi, J. Falta,  J. I. Flege, Cryst. Growth Des. 16, 4216 (2016).

Modeling ceria-based nanomaterials for catalysis and related applications

A. Bruix, K.M. Neyman, Catal. Lett. 146, 2053 (2016).

Argon FTIR spectra between 800 and 2000 cm−1: h- and i-levels and transition probabilities

P. Kubelík, E. M. Zanozina, A. Pastorek, M. Ferus, L. Juha, V. E. Chernov, A. V. Naskidashvili, and S. Civiš, J. Quant. Spectrosc. Ra. 182, 337 (2016).

Multifunctional photo/thermal catalysts for the reduction of carbon dioxide

K. C. Schwartzenberg, J. W. J. Hamilton, A. K. Lucid, E. Weitz, J. Notestein, M. Nolan, J. A. Byrne and K. A. Gray, Catal. Tod. 280, 65 (2016).

Diffusion Barriers Block Defect Occupation on Reduced CeO2(111)

P. G. Lustemberg, Y. Pan, B. J. Shaw, D. Grinter, C. Pang, G. Thornton, R. Pérez, M. V. Ganduglia-Pirovano and N. Nilius, Phys. Rev. Lett. 116, 236101 (2016).

Dopant-Induced Diffusion Processes at Metal-Oxide Interfaces Studied for Fe-and Cr-Doped MgO/Mo(001) Model Systems

S. Benedetti, N. Nilius, S. Valeri, S. Tosoni, E. Albanese and G. Pacchioni, J. Phys. Chem. C 120, 13604 (2016).

Intrinsic electron traps in atomic-layer deposited HfO2 insulators

F. Cerbu, O. Madia, D. V. Andreev, S. Fadida, M. Eizenberg, L. Breuil, J. G. Lisoni, J. A. Kittl, J. Strand, A. L. Shluger, V. V. Afanas’ev, M. Houssa and A. Stesmans, Appl. Phys. Lett. 108, 222901 (2016).